Motion Control – Yaw Pitch Stages
Van Nuys, CA – — Motion Control – A new, series of Dual-axis Yaw-and-Pitch Stages have been introduced by OES (Optimal Engineering Systems, Inc.). This new series of high precision Yaw-and-Pitch stages are ideal for precise measurements of compound curves and angles of an object during inspection or reverse engineering, laser machining and drilling, scanning, tracking, mirror positioning, and for use with coordinate measuring machines and autocollimators.